{"created":"2023-07-25T10:21:44.477871+00:00","id":860,"links":{},"metadata":{"_buckets":{"deposit":"1435a952-c273-445e-b282-7c7e550a1099"},"_deposit":{"created_by":15,"id":"860","owners":[15],"pid":{"revision_id":0,"type":"depid","value":"860"},"status":"published"},"_oai":{"id":"oai:air.repo.nii.ac.jp:00000860","sets":["590:664:671:673"]},"author_link":[],"item_10001_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2006-11-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1/2","bibliographicPageEnd":"72","bibliographicPageStart":"69","bibliographicVolumeNumber":"14","bibliographic_titles":[{"bibliographic_title":"International Journal of the Society of Materials Engineering for Resources","bibliographic_titleLang":"en"}]}]},"item_10001_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Optical films are currently used for a range of optical components. The aim of this research was to prepare wavelength selective transmission thin films which can improve the performance of solar cells. Radio frequency (RF) sputtering equipment was used for depositing the wavelength selective transmission thin film. The deposition of layers of various materials and of different thicknesses was carried out after software simulation of the wavelength selective transmission thin film. The experimental wavelength selective transmission thin film was deposited on quartz glass, and the optical characteristics of the thin film were measured with a spectrophotometer. The transmission results showed that the designed wavelength selective transmission thin film could be fabricated. The transmission range can be controlled by depositing layers of different materials and thicknesses.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10001_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Materilas Engineering for resources of Japan","subitem_publisher_language":"en"}]},"item_10001_relation_25":{"attribute_name":"関連情報","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"http://doi.org/10.5188/ijsmer.14.69","subitem_relation_type_select":"DOI"}}]},"item_10001_version_type_20":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_1724099666130":{"attribute_name":"収録物識別子","attribute_value_mlt":[{"subitem_source_identifier":"1347-9725","subitem_source_identifier_type":"PISSN"},{"subitem_source_identifier":"AA1095475X","subitem_source_identifier_type":"NCID"}]},"item_access_right":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access","subitem_access_right_uri":"http://purl.org/coar/access_right/c_abf2"}]},"item_creator":{"attribute_name":"作成者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Li, Jin","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Shima, Yusuke","creatorNameLang":"en"}]},{"creatorNames":[{"creatorName":"Fujita, Shigetaka","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2017-02-16"}],"displaytype":"detail","filename":"ijsmer14m.pdf","filesize":[{"value":"761.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"ijsmer14m.pdf","url":"https://air.repo.nii.ac.jp/record/860/files/ijsmer14m.pdf"},"version_id":"497ee386-ef18-41ce-8412-ff8561734b57"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"RF sputtering","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Wavelength selective transmission thin film","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"simulation","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Transmittance","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Preparation of SiO2/Nb2O5 Wavelength SelectiveTransmission Thin Film for Solar Battery","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Preparation of SiO2/Nb2O5 Wavelength SelectiveTransmission Thin Film for Solar Battery","subitem_title_language":"en"}]},"item_type_id":"10001","owner":"15","path":["673"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2008-03-07"},"publish_date":"2008-03-07","publish_status":"0","recid":"860","relation_version_is_last":true,"title":["Preparation of SiO2/Nb2O5 Wavelength SelectiveTransmission Thin Film for Solar Battery"],"weko_creator_id":"15","weko_shared_id":-1},"updated":"2024-08-25T18:13:34.182781+00:00"}